Plasma-Therm’s internally developed process control software surpasses industry standards in repeatability and uniformity. Real-time endpoint monitoring of etch and deposition processes leads to reliable results.
In the past, separate applications controlled various endpoint technologies. With Plasma-Therm’s newly developed EndpointWorks™, a single application addresses multiple endpoint sensor inputs. EndpointWorks™ is fully integrated with the process module control software.
EndpointWorks™ is capable of receiving inputs from many different sensors and then uses a “decision” feature to analyze the data to determine a highly reproducible endpoint.
The following sensor systems are available with EndpointWorks:
- Laser Interferometry:
Using the well-known principles of interferometry coupled with a solid state ccd camera for laser spot location, etch depths are measured using interference patterns reflected from the substrate.
Film layers are detected using light emitted from the plasma. Spectral changes occur when etch of the target layers are achieved.
Target film thickness is tracked and measured via an optical emission. By optically tracking film thickness or etch depth in real time EndpointWorks™ can counteract variables and produce accurate results every time.
- System Parameters:
EndpointWorks™ is capable of being programmed with various system parameters to detect changes triggered at endpoint. Examples: throttle valve position, matching capacitor positions.
- Custom Inputs:
EndpointWorks™ is capable of customer specific external inputs. Examples: RGA, ellipsometer.
SpectraWorks is a legacy OES endpoint control system.
SpectraWorks is currently available at version 5.1
SpectraWorks is upgradeable to EndpointWorks™ with recipe transferability.