Advanced Vacuum’s APEX SLR provides etching capabilities over a variety of materials and substrates. The small footprint, low cost, ease of use and superior performance makes the Apex SLR ideal for a wide range of uniform, high quality ICP etch applications serving R&D, FA, prototyping, pilot line and low volume production. The Apex SLR is ideal for numerous technologies such as Failure/Yield Analysis, Photonics, Solid State Lighting, MEMs, and Wireless ICP etch processing.
The Apex SLR is a continuation of Plasma-Therm’s highly regarded Shuttlelock® system in a compact, robust and easily maintained form factor.
Advanced Vacuum, a Plasma-Therm company, is the manufacturer of the Vision 300 and 400 (formerly Plasma-Therm 790+) series open-load etch and deposition systems.
The Apex SLR provides technology for etch using a high density ICP source with a RF biased lower electrode:
Apex SLR ICP (Inductively Coupled Plasma)
The ICP system utilizes a load lock with manual loading
- Process Library: The Apex SLR system uses well-established reactor technology that provides reliable performance and is supported with guidance from a continuously evolving process library.
- Endpoint: Both laser and optical emission spectroscopy endpoint technologies are available on Apex SLR to augment processing capability.
- Data Logging: Simplified data collection for sharing of process monitoring and recipe information.